Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications

From the Reviews...

"This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment."
—Randy Wallace, Department Head, Discovery Park Library, University of North TexasContent:
Chapter 1 Surface and Colloidal Chemical Aspects of Wet Cleaning (pages 1–36): Srini Raghavan, Manish Keswani and Nandini Venkataraman
Chapter 2 The Chemistry of Wet Cleaning (pages 39–94): D. Martin Knotter
Chapter 3 The Chemistry of Wet Etching (pages 95–141): D. Martin Knotter
Chapter 4 Surface Phenomena: Rinsing and Drying (pages 143–168): Karen A. Reinhardt, Richard F. Reidy and John A. Marsella
Chapter 5 Fundamental Design of Chemical Formulations (pages 169–192): Robert J. Rovito, Michael B. Korzenski, Ping Jiang and Karen A. Reinhardt
Chapter 6 Filtering, Recirculating, Reuse, and Recycling of Chemicals (pages 193–236): Barry Got